When pursuing ultimate material performance and process precision, researchers and manufacturers often face limitations imposed by conventional thermal processing methods. As atomic-level arrangements in the microscopic world increasingly determine the success of macroscopic devices, the demand grows for solutions that can deliver precise, efficient, and stable complex thermal processing.

Since 2004, Annealsys has positioned itself as an innovator in this field, specializing in the design and manufacture of cutting-edge Rapid Thermal Processing (RTP) equipment. Their systems serve applications ranging from fundamental research to full-scale production. The company's technical capabilities expanded significantly in 2022 when it integrated Jipelec, a brand with over four decades of RTP system manufacturing experience.

The Art of Temperature Control: From 1450°C to 2000°C

Annealsys RTP systems stand out for their exceptional temperature control capabilities and broad application range. The infrared lamp-based systems can achieve annealing temperatures up to 1450°C and operate in various atmospheric or vacuum conditions. This flexibility makes them suitable for diverse processes including ohmic contact annealing, ion implantation annealing, and rapid thermal chemical vapor deposition (RTCVD) for materials like graphene and hexagonal boron nitride (h-BN).

The versatile RTP equipment handles sample sizes ranging from microscopic dimensions up to 200mm wafers. For production applications, solutions span from manual loading to automated cassette transfer systems, with customized susceptor processes available for compound semiconductor wafers. The high-end Zenith series pushes temperature limits to 2000°C while maintaining stable operation for up to one hour at these extreme conditions.

RTP Series Overview: Meeting Diverse Requirements

Annealsys offers a comprehensive range of RTP systems designed for different applications and scales:

• AS-Micro 3-inch RTP System: A cost-effective solution ideal for laboratory and university research environments.
• AS-One 4-inch & 6-inch RTP Systems: Cold-wall chamber systems offering flexibility for R&D and pilot production.
• ZENITH Series (up to 2000°C): Designed for extreme high-temperature processes, available in 100mm and 200mm wafer configurations.
• AS-Premium 6-inch RTP System (Dual-side Heating): Multi-configuration platform for silicon and compound semiconductor wafers with superior temperature uniformity.
• AS-Master 200mm RTP System: Versatile cold-wall chamber system capable of temperature control from room temperature to 1450°C under high vacuum conditions.
• Jipelec JetFirst 200mm & 300mm RTP Tools: Cold-wall RTA systems leveraging Jipelec's extensive experience.
• Jipelec Jetlight 2-inch RTA System: Compact system designed for university research laboratories handling small samples.

Technical Advantages of Annealsys RTP Systems

Leading research institutions and semiconductor manufacturers worldwide select Annealsys equipment for several key reasons:

Process Flexibility: The systems support numerous thermal processes including annealing, oxidation, nitridation, diffusion, silicidation, densification, and crystallization, serving needs from small-scale R&D to full production.

Continuous Innovation: Proprietary temperature control technology enables precise profile management without overshooting. The innovative pulse annealing feature allows localized high-temperature processing while maintaining lower substrate temperatures overall.

Uniformity and Repeatability: Advanced lamp heating designs ensure excellent temperature uniformity across wafer sizes from small chips to 200mm substrates, guaranteeing consistent results in both research and production environments.

Proven Reliability: With installations in universities, research centers, and high-tech industries worldwide, Annealsys systems demonstrate long-term operational stability supported by responsive technical assistance.